Title

High-Sensitivity Material Systems For Two-Photon Three-Dimensional Microfabrication

Keywords

Chemically amplified resist; Micro-electromechanical systems (MEMS); Micro-fluidics; Optical micro-electromechanical systems (OMEMS); Photoacid generator (PAG); Positive-tone resist; Three-dimensional lithographic microfabrication; Two-photon absorption

Abstract

A photoacid generator (PAG) is described that can be efficiently activated by two-photon excitation and can be used for high-sensitivity three-dimensional micro-patterning of acid-sensitive media. The molecule has been specifically engineered to have both a large peak two-photon absorption cross section (δ= 690 × 10-50 cm4 s photon-1 at 705 nm) and a high quantum yield for the photochemical generation of acid (φH+ ≈ 0.5). Under near-infrared laser irradiation, the PAG produces acid subsequent to two-photon excitation and initiates the polymerization of epoxides. The PAG was used in conjunction with the epoxide resist SU-8 for negative-tone three-dimensional microfabrication and was incorporated into a specially formulated chemically amplified resist for positive-tone fabrication of a three-dimensional grating structure. These material systems expand the potential of three-dimensional microfabrication as a tool for manufacturing micro-electromechanical systems, micro-fluidics, and micro-optical structures.

Publication Date

5-10-2004

Publication Title

Proceedings of SPIE - The International Society for Optical Engineering

Volume

5347

Number of Pages

111-117

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1117/12.532614

Socpus ID

2142780360 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/2142780360

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