Title

Short Wavelength Sources For Microlithography

Abstract

For the past decade, the evolution of microlithography tools to generate smaller features on microchips has involved using shorter ultraviolet wavelength sources and larger numerical aperture transmissive optics for imaging the complex mask patterns onto the wafers. At present, the manufacturing tools are beginning to use the 193 nm wavelength of the ArF excimer laser. In the near future, it is likely that laser sources will not be required to achieve the necessary flux needed for the high wafer throughputs of a microlithographic manufacturing system.

Publication Date

1-1-2001

Publication Title

LEOS Summer Topical Meeting

Number of Pages

13-

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

Socpus ID

0034825043 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/0034825043

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