Title
Stabilized Droplet Target Delivery For High Power Euv Generation For Lithography
Abstract
A stabilized targeting scheme is installed in the EUV light source facility and performs high level of stability of tin-doped droplet target positioning for a long term, which is required for the EUVL sources. ©2007 IEEE.
Publication Date
12-1-2007
Publication Title
Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS
Number of Pages
484-485
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1109/LEOS.2007.4382490
Copyright Status
Unknown
Socpus ID
51249087954 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/51249087954
STARS Citation
Cunado, Jose; Takenoshita, Kazutoshi; George, Simi A.; Schmid, Tobias; and Bernath, Robert, "Stabilized Droplet Target Delivery For High Power Euv Generation For Lithography" (2007). Scopus Export 2000s. 6099.
https://stars.library.ucf.edu/scopus2000/6099