Title
Flow And Transport In Combustion Flame Cvd Of Diamond Thin Films
Abstract
This paper presents a numerical model to understand and predict diamond film deposition by combustion film assisted chemical vapor deposition method, which is perceived as a suitable technique to produce synthetic diamond under micro-gravity conditions. In this method, diamond thin film is deposited with a laminar, premixed C2H2/O2 flame. The effect of two major operating parameters, substrate-to-nozzle distance and premixed gas composition, on the rate of diamond deposition was investigated. Deposition rate increases with higher C2H2/O2 ratio, and decreases with increasing substrate-to-nozzle distance. This observation is explained with flow and transport characteristics of the flame. © 2000 by the American Institute of Aeronautics and Astronautics, Inc. All rights reserved.
Publication Date
12-1-2000
Publication Title
38th Aerospace Sciences Meeting and Exhibit
Number of Pages
-
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
Copyright Status
Unknown
Socpus ID
84894289855 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/84894289855
STARS Citation
Kapat, J. S.; Elshot, K.; and Unontakarn, P., "Flow And Transport In Combustion Flame Cvd Of Diamond Thin Films" (2000). Scopus Export 2000s. 639.
https://stars.library.ucf.edu/scopus2000/639