Title

Wet Etching Of Sputtered Tantalum Thin Films In Naoh And Koh Based Solutions

Abstract

In this paper, a wet chemical etching technique to selectively etch tantalum thin film in sodium hydroxide and potassium hydroxide based solutions was developed. Tantalum thin films were deposited by a DC-magnetron sputtering technique on silica and yttria-stabilized zirconia (YSZ) substrates. After deposition, the films were etched in hot NaOH/H 2O 2 and KOH/H 2O 2 based solutions with Au/Cr film as a hard mask. The etch rate was studied as a function of temperature and concentration of the etchants. © Springer Science+Business Media, LLC 2006.

Publication Date

5-1-2007

Publication Title

Journal of Materials Science: Materials in Electronics

Volume

18

Issue

5

Number of Pages

535-539

Document Type

Article

Personal Identifier

scopus

DOI Link

https://doi.org/10.1007/s10854-006-9053-z

Socpus ID

33847408367 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/33847408367

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