Title

Characterization Of The Tin-Doped Droplet Laser Plasma Euvl Sources For Hvm

Keywords

Debris mitigation; Droplet plasma; EUV sources; High power EUV source; Out-of-band radiation

Abstract

Tin-doped droplet target has been integrated with several lasers including high power high repetition rate lasers and demonstrated high conversion efficiencies for all the lasers. This implies the EUV source power is linearly increasing as the laser frequency goes higher. The target exhibit very low out-of-band radiation and debris emission. The drawback of increasing the repetition rate of the target and the laser will be limited. The total amount of tin consumed for a EUVL source system is also small enough to be operated for a long term without large effort for recycling of the target materials. We address and demonstrate in this paper the primary issues associated with long-term high power EUV sources for high volume manufacturing (HVM) using tin-doped droplet target.

Publication Date

10-15-2007

Publication Title

Proceedings of SPIE - The International Society for Optical Engineering

Volume

6517

Issue

PART 2

Number of Pages

-

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1117/12.713461

Socpus ID

35148853116 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/35148853116

This document is currently not available here.

Share

COinS