Title

High Repetition-Rate Lpp-Source Facility For Euvl

Keywords

EUVL; High power; High repetition-rate; Laser produced plasma

Abstract

In this work we present the status of our high repetition-rate/high power EUV source facility. The mass-limited target concept has demonstrated high conversion efficiencies (CE) previously, with precision solid state lasers. Currently, experiments are in progress with high power high repetition-rate (3-4 kHz) Q-switched laser modules. We present a new dedicated facility for the high power EUV source. Also, we present a precision EUV energy-meter, which is developed for absolute EUV energy measurements. Spectral measurements of the tin-doped droplet laser plasma are performed with a flat-field spectrometer (FFS) with a back-illuminated CCD camera. We address the issue of maintaining the calibration of the EUV optics during source operation at non-optimum intensity at high repetition-rate, which is required for CE improvement studies. Here we present the unique metrology for measuring EUV energies under a variety of irradiation conditions without degrading EUV optics, even at high repetition rates (multi-kHz).

Publication Date

10-15-2007

Publication Title

Proceedings of SPIE - The International Society for Optical Engineering

Volume

6517

Issue

PART 2

Number of Pages

-

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1117/12.713457

Socpus ID

35148830403 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/35148830403

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