Title

Comparison Of The Work Function Of Pt-Ru Binary Metal Alloys Extracted From Mos Capacitor And Schottky-Barrier-Diode Measurements

Keywords

Gate electrode; Metal alloy; Pt-Ru; Schottky; Work function

Abstract

This paper describes a systematic comparison of work function for the Pt-Ru binary-alloy metals, extracted from capacitance-voltage (C-V) characteristics of MOS capacitors and the current-voltage (C-V) and (C-V) characteristics of Schottky-barrier diodes. Our results indicate that the work function of the Pt-Ru binary-alloy system can be tuned over the wide range of 4.8-5.2 eV. Furthermore, the results indicate that the change of film properties, i.e., resistivity, work function, and crystal structure, with composition is consistent with the equilibrium-phase diagram and that the work function in the face-centered cubic and the hexagonal-close-pack single-phase regions is only weakly dependent on composition while a strong dependence is observed in the intermediate compositional range. It is also observed that work-function values obtained from the Schottky I-V analysis are significantly lower than those extracted from the MOS C-V data. © 2007 IEEE.

Publication Date

4-1-2007

Publication Title

IEEE Transactions on Electron Devices

Volume

54

Issue

4

Number of Pages

807-813

Document Type

Article

Personal Identifier

scopus

DOI Link

https://doi.org/10.1109/TED.2007.892352

Socpus ID

34147156194 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/34147156194

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