Title
The Saw Properties Of Sputtered Sio2 On X-112°Y Litao3
Abstract
The surface acoustic wave (SAW) propagation properties on the X-cut plate, 112°Y rotated, lithium tantalate (LiTaO3) substrate with and without sputtered SiO2 film layers have been investigated using interdigital transducer electrode structures. Thicknesses of SiO2 of 500 nm and 1000 nm were sputter deposited on the X-112°Y LiTaO3 substrates. A series array of aluminum electrode patterns deposited on the film facilitated the excitation of a wide frequency band of harmonic waves up to 2.0 GHz, and permitted delineation of SAW velocity and propagation loss characteristics for several values of film-thickness to acoustic-wavelength (t/λ) ratio. A resonator pattern at the substrate/film interface, permitted the capacitance ratio (Cm/Co), related to coupling factor, and the temperature coefficient of frequency (TCF) to be measured. A high velocity pseudo-SAW (HVPSAW) mode was observed with a velocity near 6300 m/s.
Publication Date
12-1-2000
Publication Title
Proceedings of the Annual IEEE International Frequency Control Symposium
Number of Pages
218-222
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
Copyright Status
Unknown
Socpus ID
0034446366 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/0034446366
STARS Citation
Hickernell, F. S., "The Saw Properties Of Sputtered Sio2 On X-112°Y Litao3" (2000). Scopus Export 2000s. 730.
https://stars.library.ucf.edu/scopus2000/730