Title
Fabrication Of Sicn Mems By Uv Lithography Of Polysilazane
Keywords
MEMS; Photo initiator; Polysilazane; SiCN; UV lithography
Abstract
A novel process with low cost to fabricate SiCN MEMS based on UV lithographic technique is present in this paper. The prepared MEMS are very promising to be used in high-temperature environments. By adding a photo initiator to the polysilazane precursor, the precursor becomes UV-sensitive and can be solidified upon exposure to UV light, which leads to the formation of UV photo lithographical patterns. Key issues of the fabrication process are investigated and various SiCN MEMS structures are fabricated by this technique.
Publication Date
1-1-2007
Publication Title
Key Engineering Materials
Volume
336-338 II
Number of Pages
1477-1480
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.4028/0-87849-410-3.1477
Copyright Status
Unknown
Socpus ID
33947202755 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/33947202755
STARS Citation
Wang, Huatao; Xie, Zhipeng; Yang, Weiyou; Liu, Guoquan; and An, Linan, "Fabrication Of Sicn Mems By Uv Lithography Of Polysilazane" (2007). Scopus Export 2000s. 7489.
https://stars.library.ucf.edu/scopus2000/7489