Title

Euv Generation From Lithium Laser Plasma For Lithography

Keywords

EUV lithography; EUV sources; EUV spectroscopy; Laser plasmas; Lithium; Tin

Abstract

Hydrogen-like line emission from lithium has long been considered a candidate for EUV light source for lithography. We have completed the evaluation of the potential of lithium as a laser-plasma source, both theoretically and experimentally. Theoretical calculations show optimum intensity region for lithium for attaining high conversion is close to 5.0 × 10 11 W/cm 2, with plasma temperature near 50 eV. Experimental studies compare directly, the conversion efficiency and optimum irradiation conditions for both planar tin and lithium solid targets. Best conversion efficiency found in this study is 2% for lithium, while CE measured is better than 4% for tin target at identical experimental conditions.

Publication Date

7-10-2006

Publication Title

Proceedings of SPIE - The International Society for Optical Engineering

Volume

6151 II

Number of Pages

-

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1117/12.660584

Socpus ID

33745628311 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/33745628311

This document is currently not available here.

Share

COinS