Title
Effect Of Two- And Three-Zone Phase Masks On The Axial And Transverse Intensity Distribution Under High Numerical Aperture Focusing
Keywords
Annular multi-phase plate; Diffractive optical elements; Multi-photon three-dimensional microfabrication; Photolithography; Point-spread-function; Super-resolution
Abstract
Vector diffraction theory was applied to study computationally the effect of two and three-zone annular multi-phase plates (AMPs) on the three-dimensional point-spread-function (PSF). The two- and four-dimensional solutions spaces associated with a two- and three-zone AMP, respectively, were discretized and the PSF was calculated using the Wolf diffraction integrals for each unique combination of zone radius and relative phase. Conditions are identified in which a three-zone AMP generates an intensity distribution that is super-resolved by 19% in the axial direction with minimal change in the transverse distribution and sufficiently small axial side-lobes that this intensity pattern could be used for advanced photolithographic techniques, such as multi-photon three-dimensional microfabrication.
Publication Date
5-3-2006
Publication Title
Proceedings of SPIE - The International Society for Optical Engineering
Volume
6110
Number of Pages
-
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1117/12.647618
Copyright Status
Unknown
Socpus ID
33646069961 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/33646069961
STARS Citation
Kuebler, Stephen M. and Jabbour, Toufic, "Effect Of Two- And Three-Zone Phase Masks On The Axial And Transverse Intensity Distribution Under High Numerical Aperture Focusing" (2006). Scopus Export 2000s. 8646.
https://stars.library.ucf.edu/scopus2000/8646