Title
Efficient 13.5 Nm Euv Generation From A Laser Plasma
Abstract
We describe a source of 13.5 nm radiation, based on multi-kHz laser-plasmas created from tin-bearing micro-droplets that has a high probability of satisfying the requirements for EUVL, the next generation lithography for computer chip fabrication. © 2005 Optical Society of America.
Publication Date
1-1-2006
Publication Title
Optics InfoBase Conference Papers
Number of Pages
-
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
Copyright Status
Unknown
Socpus ID
84899079181 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/84899079181
STARS Citation
Richardson, M.; Koay, C. S.; Takenoshita, K.; George, S.; and Bernath, R., "Efficient 13.5 Nm Euv Generation From A Laser Plasma" (2006). Scopus Export 2000s. 8997.
https://stars.library.ucf.edu/scopus2000/8997
COinS