Title

Spectroscopic Ellipsometry Of Materials For Infrared Micro-Device Fabrication

Abstract

For many common types of process materials used in the fabrication of infrared microelectronic devices there is a lack of information available in the literature regarding their thin-film optical properties over the wavelength range of 2 to 30 micrometers. In this article, spectroscopic ellipsometry is used to determine room-temperature optical constants in the infrared for a variety of organic and inorganic coatings commonly used in fabrication. Examples include coatings used for photolithography, coating, passivation, planarization, index matching, and stand-off. Applications include infrared frequency selective surfaces, antennas, micro-displays, and flexible substrates. © 2008 Wiley-VCH Verlag GmbH & Co. KGaA.

Publication Date

12-1-2008

Publication Title

Physica Status Solidi (C) Current Topics in Solid State Physics

Volume

5

Issue

5

Number of Pages

1113-1116

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1002/pssc.200777748

Socpus ID

54849438179 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/54849438179

This document is currently not available here.

Share

COinS