Title

Critical Nanofabrication Parameters For The E-Beam Assisted Design Of A Subwavelength Aluminum Mesh

Keywords

E-beam lithography; Finite difference time domain; Light emitting diodes; Nitride; Photodetectors; Surface plasmon; Ultraviolet

Abstract

Using finite difference time domain simulations and e-beam assisted lithography we designed and fabricated high transmission transparent contacts for UV nitride devices which consist in perpendicular sets of parallel aluminum lines with a period as low as 260 nm. Transmittance values as high as 100% were predicted for aluminum meshes with the optimized periods, metal line widths and thicknesses. Simulations were compared with optical transmittance measurements. The critical parameters -such as grain size, edge roughness and mesh coating- were determined. The large aluminum grain was decreased by performing a cold aluminum deposition. The aluminum oxide layer over the aluminum mesh was found to reduce the mesh transmittance. Several alternatives were studied to overcome this issue such as coating the mesh with a thin gold or silicon dioxide layer. While the second option appeared promising the addition of the gold layer required much more improvement. © 2010 Copyright SPIE - The International Society for Optical Engineering.

Publication Date

5-3-2010

Publication Title

Proceedings of SPIE - The International Society for Optical Engineering

Volume

7591

Number of Pages

-

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1117/12.840546

Socpus ID

77951534859 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/77951534859

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