Title
Surface Modification Of Carbon Post Arrays By Atomic Layer Deposition Of Zno Film
Keywords
Atomic layer deposition; Carbon microelectromechanical system; Pyrolysis; Zinc oxide
Abstract
The applicability of atomic layer deposition (ALD) process to the carbon microelectromechanical system technology was studied for a surface modification method of the carbon post electrodes. A conformal coating of the ALD-ZnO film was successfully demonstrated on the carbon post arrays which were fabricated by the traditional photolithography and subsequent two-step pyrolysis. A significant Zn diffusion into the underlying carbon posts was observed during the ALD process. The addition of a sputter-deposited ZnO interfacial layer efficiently blocked the Zn diffusion without altering the microstructure and surface morphology of the ALD-ZnO film. © 2011 American Scientific Publishers.
Publication Date
8-1-2011
Publication Title
Journal of Nanoscience and Nanotechnology
Volume
11
Issue
8
Number of Pages
7322-7326
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1166/jnn.2011.4827
Copyright Status
Unknown
Socpus ID
84863052062 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/84863052062
STARS Citation
Lee, Hyun Ae; Byun, Young Chul; Singh, Umesh; Cho, Hyoung J.; and Kim, Hyoungsub, "Surface Modification Of Carbon Post Arrays By Atomic Layer Deposition Of Zno Film" (2011). Scopus Export 2010-2014. 2675.
https://stars.library.ucf.edu/scopus2010/2675