Title

Surface Modification Of Carbon Post Arrays By Atomic Layer Deposition Of Zno Film

Keywords

Atomic layer deposition; Carbon microelectromechanical system; Pyrolysis; Zinc oxide

Abstract

The applicability of atomic layer deposition (ALD) process to the carbon microelectromechanical system technology was studied for a surface modification method of the carbon post electrodes. A conformal coating of the ALD-ZnO film was successfully demonstrated on the carbon post arrays which were fabricated by the traditional photolithography and subsequent two-step pyrolysis. A significant Zn diffusion into the underlying carbon posts was observed during the ALD process. The addition of a sputter-deposited ZnO interfacial layer efficiently blocked the Zn diffusion without altering the microstructure and surface morphology of the ALD-ZnO film. © 2011 American Scientific Publishers.

Publication Date

8-1-2011

Publication Title

Journal of Nanoscience and Nanotechnology

Volume

11

Issue

8

Number of Pages

7322-7326

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1166/jnn.2011.4827

Socpus ID

84863052062 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/84863052062

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