Title

Fabrication Of Polymer-Derived Ceramic Nanostructures By Imprint Lithography

Keywords

Imprint lithography; Photonic structures; Polymer-derived ceramics; Sub-100nm features

Abstract

The conventional technique used for manufacturing miniaturized ceramic components is the powder route which typically does not allow the fabrication of feature sizes smaller than 0.1mm. With the availability of preceramic polymers, processed by various lithographic methods, it is possible to realize feature sizes below 1μm in size on polymer derived ceramics (PDC). Recently, sub-500nm structures have been fabricated by soft lithography which uses a sacrificial mold. This method is not commercially viable for the production of sub-100nm feature devices in large numbers due to the tedious pre- and post processing steps involved. Currently, no studies are present in the direction of simply printing the nanostructures below 100nm on Si 3N 4/SiO 2 to the best of our knowledge. Here, we present an easy method of fabricating sub-100nm photonic devices in polysilazane which is a precursor for preparing Si 3N 4 and SiC.

Publication Date

8-20-2012

Publication Title

Technical Proceedings of the 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012

Number of Pages

761-763

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

Socpus ID

84864990341 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/84864990341

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