Title

In Situ Coarsening Study Of Inverse Micelle-Prepared Pt Nanoparticles Supported On Γ-Al 2O 3: Pretreatment And Environmental Effects

Abstract

The thermal stability of inverse micelle prepared Pt nanoparticles (NPs) supported on nanocrystalline γ-Al 2O 3 was monitored in situ under different chemical environments (H 2, O 2, H 2O) via extended X-ray absorption fine-structure spectroscopy (EXAFS) and ex situ via scanning transmission electron microscopy (STEM). Drastic differences in the stability of identically synthesized NP samples were observed upon exposure to two different pre-treatments. In particular, exposure to O 2 at 400°C before high temperature annealing in H 2 (800°C) was found to result in the stabilization of the inverse micelle prepared Pt NPs, reaching a maximum overall size after moderate coarsening of ∼1 nm. Interestingly, when an analogous sample was pre-treated in H 2 at ∼400°C, a final size of ∼5 nm was reached at 800°C. The beneficial role of oxygen in the stabilization of small Pt NPs was also observed in situ during annealing treatments in O 2 at 450°C for several hours. In particular, while NPs of 0.5 ± 0.1 nm initial average size did not display any significant sintering (0.6 ± 0.2 nm final size), an analogous thermal treatment in hydrogen leads to NP coarsening (1.2 ± 0.3 nm). The same sample pre-dosed and annealed in an atmosphere containing water only displayed moderate sintering (0.8 ± 0.3 nm). Our data suggest that PtO x species, possibly modifying the NP/support interface, play a role in the stabilization of small Pt NPs. Our study reveals the enhanced thermal stability of inverse micelle prepared Pt NPs and the importance of the sample pre-treatment and annealing environment in the minimization of undesired sintering processes affecting the catalytic performance of nanosized particles. © 2012 the Owner Societies.

Publication Date

8-28-2012

Publication Title

Physical Chemistry Chemical Physics

Volume

14

Issue

32

Number of Pages

11457-11467

Document Type

Article

Personal Identifier

scopus

DOI Link

https://doi.org/10.1039/c2cp41339f

Socpus ID

84864200527 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/84864200527

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