Title
Nldmos Esd Scaling Under Human Metal Model For 40-V Mixed-Signal Applications
Keywords
Electrostatic discharge (ESD); human metal model (HMM); laterally diffused MOS (LDMOS)
Abstract
Electrostatic discharge (ESD) robustness of LDMOS (laterally diffused MOS) devices is found to be highly dependent on the type of ESD stress. In particular, the device's ESD robustness does not scale with the device width, and this condition is substantially aggravated during the International Electrotechnical Commission (IEC) 61000-4-2 stress condition. IEC 61000-4-2 is a system-level ESD standard increasingly being adopted in the industry for ESD robustness assessment at the integrated circuit level. A comprehensive evaluation under the IEC 61000-4-2 stress impacting precision circuit designs is introduced in this letter for variable width LDMOS devices fabricated in a 0.18-μm bipolar-CMOS-DMOS process for 40-V mixed-signal applications. © 2012 IEEE.
Publication Date
10-10-2012
Publication Title
IEEE Electron Device Letters
Volume
33
Issue
11
Number of Pages
1595-1597
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1109/LED.2012.2213574
Copyright Status
Unknown
Socpus ID
84867897123 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/84867897123
STARS Citation
Malobabic, Slavica; Salcedo, Javier A.; Hajjar, Jean Jacques; and Liou, Juin J., "Nldmos Esd Scaling Under Human Metal Model For 40-V Mixed-Signal Applications" (2012). Scopus Export 2010-2014. 4642.
https://stars.library.ucf.edu/scopus2010/4642