Title
Failure Analysis Of Gate-All-Around Nanowire Field Effect Transistor Under Tlp Test
Keywords
Electrostatic discharge (ESD); Failure analysis; Nanowire FET; TLP
Abstract
Electrostatic discharge (ESD) characters of Nanowire Field Effect Transistors have been tested and analyzed in detail in this paper. TLP (transmission line pulsing technique) and semiconductor characterization system have been used for experiments. The failure currents and leakage currents of Nanowire Field Effect Transistor are characterized. Also, physical insights and failure model are provided to analyze the failure mechanism.
Publication Date
3-13-2014
Publication Title
2014 IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC 2014
Number of Pages
-
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1109/EDSSC.2014.7061114
Copyright Status
Unknown
Socpus ID
84949925890 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/84949925890
STARS Citation
Zhang, Guoyan; Dong, Aihua; Liu, Nie; Tian, Rui; and Yang, Xuejiao, "Failure Analysis Of Gate-All-Around Nanowire Field Effect Transistor Under Tlp Test" (2014). Scopus Export 2010-2014. 8848.
https://stars.library.ucf.edu/scopus2010/8848