Title
Effect Of Annealing On Electronic Carrier Transport Properties Of Gamma- Irradiated Algan/Gan High Electron Mobility Transistors
Abstract
AlGaN/GaN High Electron Mobility Transistors were irradiated with 60Co gamma-ray doses from 100 Gy up to a maximum dose of 1000 Gy. After irradiation, the devices were annealed at 200° C for 25 minutes. Annealing of the gamma irradiated transistors show that partial recovery of device performance is possible at this temperature. The impact of irradiation and annealing on minority carrier diffusion length and activation energy were monitored through the use of the Electron Beam Induced Current method. Impact on transfer, gate, and drain characteristics were analyzed through current-voltage measurements.
Publication Date
1-1-2014
Publication Title
ECS Transactions
Volume
61
Issue
4
Number of Pages
171-177
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1149/06104.0171ecst
Copyright Status
Unknown
Socpus ID
84925063219 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/84925063219
STARS Citation
Yadav, A.; Schwarz, C.; Shatkhin, M.; Wang, L.; and Flitsiyan, E., "Effect Of Annealing On Electronic Carrier Transport Properties Of Gamma- Irradiated Algan/Gan High Electron Mobility Transistors" (2014). Scopus Export 2010-2014. 9392.
https://stars.library.ucf.edu/scopus2010/9392