Title

Patterning Of Oxide-Hardened Gold Black By Photolithography And Metal Lift-Off

Keywords

Bolometer; Gold black; Infrared; MEMS; Pattering; Photolithography

Abstract

A method to pattern infrared-absorbing gold black by conventional photolithography and lift-off is described. A photo-resist pattern is developed on a substrate by standard photolithography. Gold black is deposited over the whole by thermal evaporation in an inert gas at ∼1 Torr. SiO2 is then deposited as a protection layer by electron beam evaporation. Lift-off proceeds by dissolving the photoresist in acetone. The resulting sub-millimeter size gold black patterns that remain on the substrate retain high infrared absorption out to ∼5 μm wavelength and exhibit good mechanical stability. This technique allows selective application of gold black coatings to the pixels of thermal infrared imaging array detectors. © 2013 Elsevier B.V. All rights reserved.

Publication Date

1-1-2014

Publication Title

Infrared Physics and Technology

Volume

62

Number of Pages

94-99

Document Type

Article

Personal Identifier

scopus

DOI Link

https://doi.org/10.1016/j.infrared.2013.11.005

Socpus ID

84889634870 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/84889634870

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