Impact Of Ozone-Based Cleaning On Surface Recombination With Different Passivation Materials

Keywords

chemical oxidation; cleaning; passivation; surface preparation

Abstract

In this work, the impact of different ozone-based cleaning processes on the level of surface passivation achieved is determined and compared against the RCA cleaning processes. Two different passivation materials are used in this study, including hydrogenated amorphous silicon and silicon nitride plasma enhanced chemical vapor deposition (PECVD). Photoconductance measurements and calibrated photoluminescence imaging are used to evaluate the level of passivation achieved and spatial uniformity for the different cleaning processes.

Publication Date

12-14-2015

Publication Title

2015 IEEE 42nd Photovoltaic Specialist Conference, PVSC 2015

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1109/PVSC.2015.7356333

Socpus ID

84961589482 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/84961589482

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