Ionic Conductivity Of Bias Sputtered Lithium Phosphorus Oxy-Nitride Thin Films
Keywords
Density of defects; ICP/OES chemical analysis; Ionic conductivity and its correlation; LiPON solid state electrolyte; RF reactive sputter deposition; XPS depth profiling
Abstract
This manuscript reports a study of the ionic conductivity of radiofrequency sputter deposited, lithium phosphorous oxy-nitride (LIPON), solid state electrolyte amorphous thin films. Films having compositions near Li2.5PO3.5N0.5 were deposited under varying conditions of process gas, substrate bias, and deposition temperature. To understand the variations in ionic conductivity observed, the films were extensively characterized to examine structural and compositional differences, including examination by x-ray photoelectron spectroscopy (XPS), inductively coupled plasma-optical emission spectroscopy, and spectroscopic ellipsometry. For the XPS study, depth profiling was used to allow a critical examination of the role of triply coordinated nitrogen in the ionic conductivity of LIPON. The highest ionic conductivity of 9.8 × 10- 6 S/cm was obtained at an elevated deposition temperature and is correlated to a reduced density of defects, as indicated from the optical characterization.
Publication Date
4-1-2016
Publication Title
Solid State Ionics
Volume
287
Number of Pages
48-59
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1016/j.ssi.2016.01.046
Copyright Status
Unknown
Socpus ID
84959419698 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/84959419698
STARS Citation
Mani, Prabhu Doss; Saraf, Shashank; Singh, Virendra; Real-Robert, Maria; and Vijayakumar, Arun, "Ionic Conductivity Of Bias Sputtered Lithium Phosphorus Oxy-Nitride Thin Films" (2016). Scopus Export 2015-2019. 3311.
https://stars.library.ucf.edu/scopus2015/3311