Cmos Transistor Reliability And Variability Mechanisms
Abstract
This chapter talks about device reliability mechanisms such as hot electron injection, gate oxide breakdown, negative bias temperature instability and process variation.
Publication Date
1-1-2016
Publication Title
SpringerBriefs in Applied Sciences and Technology
Issue
9789811008825
Number of Pages
3-9
Document Type
Article; Book Chapter
Personal Identifier
scopus
DOI Link
https://doi.org/10.1007/978-981-10-0884-9_2
Copyright Status
Unknown
Socpus ID
85027674981 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/85027674981
STARS Citation
Yuan, Jiann Shiun, "Cmos Transistor Reliability And Variability Mechanisms" (2016). Scopus Export 2015-2019. 3759.
https://stars.library.ucf.edu/scopus2015/3759
COinS