Effective Third-Order Nonlinearities In Refractory Plasmonic Tin Thin Films

Abstract

Here we study the third-order susceptibility of TiN thin films using the dual-arm Z-scan technique at 780 nm and 1550 nm. Due to its refractory nature, TiN is a promising metallic nonlinear component.

Publication Date

12-16-2016

Publication Title

2016 Conference on Lasers and Electro-Optics, CLEO 2016

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1364/cleo_qels.2016.fw4a.4

Socpus ID

85010645014 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/85010645014

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