Title
Effective Third-Order Nonlinearities In Refractory Plasmonic Tin Thin Films
Abstract
Here we study the third-order susceptibility of TiN thin films using the dual-arm Z-scan technique at 780 nm and 1550 nm. Due to its refractory nature, TiN is a promising metallic nonlinear component.
Publication Date
12-16-2016
Publication Title
2016 Conference on Lasers and Electro-Optics, CLEO 2016
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1364/cleo_qels.2016.fw4a.4
Copyright Status
Unknown
Socpus ID
85010645014 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/85010645014
STARS Citation
Kinsey, Nathaniel; Syed, Akbar Ali; Courtwright, Devon; Devault, Clayton; and Bonner, Carl E., "Effective Third-Order Nonlinearities In Refractory Plasmonic Tin Thin Films" (2016). Scopus Export 2015-2019. 3958.
https://stars.library.ucf.edu/scopus2015/3958