Material Response Of Semiconductors Irradiated With Ir Ultrashort Laser Pulses

Abstract

We utilize near- and mid-IR ultrafast laser radiation to investigate the processing of crystalline silicon with different dopants. A numerical model is adopted to simulate the material response depending on the wavelength and the dopant concentration.

Publication Date

1-7-2016

Publication Title

2015 11th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2015

Volume

2

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1109/CLEOPR.2015.7375986

Socpus ID

84963999522 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/84963999522

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