Effective Third-Order Nonlinearities In Metallic Refractory Titanium Nitride Thin Films

Abstract

Nanophotonic devices offer an unprecedented ability to concentrate light into small volumes which can greatly increase nonlinear effects. However, traditional plasmonic materials suffer from low damage thresholds and are not compatible with standard semiconductor technology. Here we study the nonlinear optical properties in the novel refractory plasmonic material titanium nitride using the Z-scan method at 1550 nm and 780 nm. We compare the extracted nonlinear parameters for TiN with previous works on noble metals and note a similarly large nonlinear optical response. However, TiN films have been shown to exhibit a damage threshold up to an order of magnitude higher than gold films of a similar thickness, while also being robust, cost-efficient, bio- and CMOScompatible. Together, these properties make TiN a promising material for metal-based nonlinear optics.

Publication Date

1-1-2015

Publication Title

Optical Materials Express

Volume

5

Issue

11

Number of Pages

2395-2403

Document Type

Article

Personal Identifier

scopus

DOI Link

https://doi.org/10.1364/OME.5.002395

Socpus ID

84947746508 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/84947746508

This document is currently not available here.

Share

COinS