Enhanced Ablation With A Femtosecond-Nanosecond Dual-Pulse

Keywords

Dual-pulse ablation; Femtosecond ablation; Femtosecond filamentation; Laser ablation; Nanosecond ablation

Abstract

Single-shot ablation of GaAs samples by a collinear femtosecond-nanosecond (fs-ns) dual-pulse is investigated. Significantly enhanced material removal is achieved by optimally combining a single 8 ns pulse at 1064 nm and a single 50 fs pulse at 800 nm in time. The resulting ablation craters are examined for inter-pulse delays ranging from -50 ns (ns first) to +1 μs (fs first) as well as very long delays of ±30 s. Crater profilometry is conducted with white light interferometry and optical microscopy to determine the volume of ablated material and identify surface features that reveal information about the physical mechanism of material removal during fs-ns dual-pulse ablation.

Publication Date

1-1-2018

Publication Title

Proceedings of SPIE - The International Society for Optical Engineering

Volume

10522

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1117/12.2290062

Socpus ID

85048561695 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/85048561695

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