Patterning of oxide-hardened gold black by photolithography and metal lift-off
Abbreviated Journal Title
Infrared Phys. Technol.
Gold black; Pattering; MEMS; Photolithography; Infrared; Bolometer; FOCAL-PLANE ARRAY; ABSORBER; DEPOSITS; STRESS; Instruments & Instrumentation; Optics; Physics, Applied
A method to pattern infrared-absorbing gold black by conventional photolithography and lift-off is described. A photo-resist pattern is developed on a substrate by standard photolithography. Gold black is deposited over the whole by thermal evaporation in an inert gas at similar to 1 Torr. SiO2 is then deposited as a protection layer by electron beam evaporation. Lift-off proceeds by dissolving the photoresist in acetone. The resulting sub-millimeter size gold black patterns that remain on the substrate retain high infrared absorption out to similar to 5 mu m wavelength and exhibit good mechanical stability. This technique allows selective application of gold black coatings to the pixels of thermal infrared imaging array detectors. (C) 2013 Elsevier B.V. All rights reserved.
Infrared Physics & Technology
"Patterning of oxide-hardened gold black by photolithography and metal lift-off" (2014). Faculty Bibliography 2010s. 5929.