Patterning of oxide-hardened gold black by photolithography and metal lift-off

    Authors

    D. Panjwani; M. Yesiltas; J. Nath; D. E. Maukonen; I. Rezadad; E. M. Smith; R. E. Peale; C. Hirschmugl; J. Sedlmair; R. Wehlitz; M. Unger;G. Boreman

    Comments

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    Abbreviated Journal Title

    Infrared Phys. Technol.

    Keywords

    Gold black; Pattering; MEMS; Photolithography; Infrared; Bolometer; FOCAL-PLANE ARRAY; ABSORBER; DEPOSITS; STRESS; Instruments & Instrumentation; Optics; Physics, Applied

    Abstract

    A method to pattern infrared-absorbing gold black by conventional photolithography and lift-off is described. A photo-resist pattern is developed on a substrate by standard photolithography. Gold black is deposited over the whole by thermal evaporation in an inert gas at similar to 1 Torr. SiO2 is then deposited as a protection layer by electron beam evaporation. Lift-off proceeds by dissolving the photoresist in acetone. The resulting sub-millimeter size gold black patterns that remain on the substrate retain high infrared absorption out to similar to 5 mu m wavelength and exhibit good mechanical stability. This technique allows selective application of gold black coatings to the pixels of thermal infrared imaging array detectors. (C) 2013 Elsevier B.V. All rights reserved.

    Journal Title

    Infrared Physics & Technology

    Volume

    62

    Publication Date

    1-1-2014

    Document Type

    Article

    Language

    English

    First Page

    94

    Last Page

    99

    WOS Identifier

    WOS:000331414200015

    ISSN

    1350-4495

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