Keywords

Lipon; ionic conductivity; deposition temperature; substrate bias; xps; icp/oes

Abstract

Lithium phosphorus oxy-nitride (LiPON) thin films are widely studied and used as a thin film electrolyte for lithium ion battery applications. LiPON thin films may be prepared by many techniques, but RF sputter deposition is most frequently used and was investigated in this dissertation, in spite of its low deposition rate, because of it offers more reliable and controllable processing. This dissertation includes the methodologies of sputter deposition and materials characterization of the LiPON thin film electrolytes. The LiPON thin films were deposited under varying conditions of process gas, substrate bias, and deposition temperature. To understand the variations in ionic conductivity observed, the films were extensively characterized to examine structural and compositional differences, including examination by x-ray photoelectron spectroscopy (XPS), inductively coupled plasma optical emission spectroscopy (ICP/OES), and spectroscopic ellipsometry. In addition, film density, and the intrinsic stress of the deposited films were also studied. The highest ionic conductivity of 9.8 x 10-6 S/cm was obtained at elevated deposition temperature and is correlated to a reduced density of defects, as indicated from the optical characterization.

Notes

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Graduation Date

2015

Semester

Summer

Advisor

Coffey, Kevin

Degree

Doctor of Philosophy (Ph.D.)

College

College of Engineering and Computer Science

Department

Materials Science Engineering

Degree Program

Engineering and Computer Science

Format

application/pdf

Identifier

CFE0005835

URL

http://purl.fcla.edu/fcla/etd/CFE0005835

Language

English

Release Date

August 2015

Length of Campus-only Access

None

Access Status

Doctoral Dissertation (Open Access)

Subjects

Dissertations, Academic -- Engineering and Computer Science; Engineering and Computer Science -- Dissertations, Academic

Restricted to the UCF community until August 2015; it will then be open access.

Included in

Engineering Commons

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