Title
Deposition and x-ray photoelectron spectroscopy studies on sputtered cerium dioxide thin films
Abbreviated Journal Title
J. Vac. Sci. Technol. A-Vac. Surf. Films
Keywords
Ceo2; Materials Science; Coatings & Films; Physics; Applied
Abstract
Cerium dioxide is a rare earth oxide material that can be useful in various optical and electronic applications because of its high refractive index and its dielectric constant. The purpose of this study was to conduct an x-ray photoelectron spectroscopy analysis of sputtered cerium dioxide thin films. The thin films were deposited onto glass substrates using rf magnetron sputtering. A cerium dioxide target was used and various oxygen-argon gas flow ratios under different sputtering power levels were used for deposition. The results presented here characterize the properties of the rf sputtered cerium dioxide thin films under different deposition conditions.
Journal Title
Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films
Volume
15
Issue/Number
1
Publication Date
1-1-1997
Document Type
Article
DOI Link
Language
English
First Page
52
Last Page
56
WOS Identifier
ISSN
0734-2101
Recommended Citation
Sundaram, K. B.; Wahid, P. F.; and Melendez, O., "Deposition and x-ray photoelectron spectroscopy studies on sputtered cerium dioxide thin films" (1997). Faculty Bibliography 1990s. 2111.
https://stars.library.ucf.edu/facultybib1990/2111
Comments
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