Keywords
Thin-films; constants; 1216-A; 24-A; Engineering; Electrical & Electronic; Nanoscience & Nanotechnology; Physics; Applied
Abstract
An iridium-coated Offner 1:1 ring field camera has been used to carry out projection lithography using 42 nm light from an undulator in the vacuum ultra violet storage ring at Brookhaven National Laboratory. Near-diffraction-limited resolution has been obtained showing features as small as 0.2-mu-m within a 2 mm x 0.25 mm image field. Images of both transmission and reflection masks have been obtained. The impact of source coherence on imagery has been investigated. Hydrocarbon contamination problems experienced in this photon energy range have been investigated and possible solutions are suggested.
Journal Title
Journal of Vacuum Science & Technology B
Volume
9
Issue/Number
6
Publication Date
1-1-1991
Document Type
Article; Proceedings Paper
DOI Link
Language
English
First Page
3193
Last Page
3197
WOS Identifier
ISSN
1071-1023
Recommended Citation
MacDowell, A. A.; Bjorkholm, J. E.; Bokor, J.; Eichner, L.; Freeman, R. R.; Mansfield, W. M.; Pastalan, J.; Szeto, L. H.; Tennant, D. M.; Wood, O. R. II; Jewell, T. E.; Waskiewicz, W. K.; White, D. L.; Windt, D. L.; Silfvast, W. T.; and Zernike, F., "Soft X-Ray Projection Lithography Using a 1-1 Ring Field Optical-System" (1991). Faculty Bibliography 1990s. 278.
https://stars.library.ucf.edu/facultybib1990/278
Comments
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