Title

Metal-Oxide Thin-Films With Reduced Residual Absorption Deposited In A Reactive Low-Voltage Ion-Plating Process With N-2 Activation

Authors

Authors

S. Zarrabian; A. Grogan; X. Q. Hu; C. Lee;K. H. Guenther

Comments

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Abbreviated Journal Title

Opt. Eng.

Keywords

ION PLATINGS; OXIDE COATINGS; PLASMA DEPOSITION; THIN FILMS; GAS; O-2; Optics

Abstract

Mechanisms have been investigated for increasing the abundance of atomic oxygen in the process environment during reactive low-voltage ion plating, a plasma-assisted evaporation process. Feeding several percent of nitrogen into the coating chamber led to enhanced oxidation and consequential reduction of residual optical absorption of ion-plated oxide films of tantala.

Journal Title

Optical Engineering

Volume

32

Issue/Number

3

Publication Date

1-1-1993

Document Type

Article

Language

English

First Page

553

Last Page

559

WOS Identifier

WOS:A1993KQ38800020

ISSN

0091-3286

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