Metal-Oxide Thin-Films With Reduced Residual Absorption Deposited In A Reactive Low-Voltage Ion-Plating Process With N-2 Activation

    Authors

    S. Zarrabian; A. Grogan; X. Q. Hu; C. Lee;K. H. Guenther

    Comments

    Authors: contact us about adding a copy of your work at STARS@ucf.edu

    Abbreviated Journal Title

    Opt. Eng.

    Keywords

    ION PLATINGS; OXIDE COATINGS; PLASMA DEPOSITION; THIN FILMS; GAS; O-2; Optics

    Abstract

    Mechanisms have been investigated for increasing the abundance of atomic oxygen in the process environment during reactive low-voltage ion plating, a plasma-assisted evaporation process. Feeding several percent of nitrogen into the coating chamber led to enhanced oxidation and consequential reduction of residual optical absorption of ion-plated oxide films of tantala.

    Journal Title

    Optical Engineering

    Volume

    32

    Issue/Number

    3

    Publication Date

    1-1-1993

    Document Type

    Article

    Language

    English

    First Page

    553

    Last Page

    559

    WOS Identifier

    WOS:A1993KQ38800020

    ISSN

    0091-3286

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