Title

Deposition Parameter Studies And Surface-Acoustic-Wave Characterization Of Pecvd Silicon-Nitride Films On Lithium-Niobate

Authors

Authors

J. H. Hines; D. C. Malocha; K. B. Sundaram; K. J. Casey;K. R. Lee

Comments

Authors: contact us about adding a copy of your work at STARS@ucf.edu

Abbreviated Journal Title

IEEE Trans. Ultrason. Ferroelectr. Freq. Control

Keywords

PLASMA-ENHANCED CVD; Acoustics; Engineering, Electrical & Electronic

Abstract

Silicon nitride films were deposited by a plasma enhanced chemical vapor deposition technique using silane-ammonia as the reactant gas mixture. The influence of the process parameters such as flow ratio of the reactant gases, pressure, substrate temperature, RF power, time of deposition and electrode spacing on the deposition and etch rates were investigated. From the matrix of deposition conditions, the deposition parameters for high quality films applicable to surface acoustic wave (SAW) technology were found. Experimental results on the acoustic loss, reflectivity and velocity dispersion for the fabricated devices are presented.

Journal Title

Ieee Transactions on Ultrasonics Ferroelectrics and Frequency Control

Volume

42

Issue/Number

3

Publication Date

1-1-1995

Document Type

Article

DOI Link

http://dx.doi.org/10.1109/58.384449

Language

English

First Page

397

Last Page

403

WOS Identifier

WOS:A1995QV97300011

ISSN

0885-3010

Recommended Citation

"Deposition Parameter Studies And Surface-Acoustic-Wave Characterization Of Pecvd Silicon-Nitride Films On Lithium-Niobate" (1995). Faculty Bibliography 1990s. 2997.
https://stars.library.ucf.edu/facultybib1990/2997