Abbreviated Journal Title
J. Vac. Sci. Technol. B
Keywords
OPTICS; Engineering; Electrical & Electronic; Nanoscience & Nanotechnology; Physics; Applied
Abstract
Laser-produced plasmas are one of the most likely sources to be used for soft x-ray projection lithography. The characteristics of these sources are described in terms of the expected radiation efficiency within the illumination bandwidth of a lithographic system. Measurements of the plasma particulate emission are described and techniques for interdicting this emission before it reaches the illumination optics are discussed. The laser requirements are obtained for a lithographic system producing a wafer rate of 60, 6 in. wafers per hour.
Journal Title
Journal of Vacuum Science & Technology B
Volume
10
Issue/Number
6
Publication Date
1-1-1992
Document Type
Article; Proceedings Paper
DOI Link
Language
English
First Page
3126
Last Page
3133
WOS Identifier
ISSN
1071-1023
Recommended Citation
Silfvast, W. T.; Richardson, M. C.; Bender, H.; Hanzo, A.; Yanovsky, V.; Jin, F.; and Thorpe, J., "Laser-Produced Plasmas For Soft-X-Ray Projection Lithography" (1992). Faculty Bibliography 1990s. 3090.
https://stars.library.ucf.edu/facultybib1990/3090
Comments
Authors: contact us about adding a copy of your work at STARS@ucf.edu