Optical Wave-Guide Characterization Of Dielectric Films Deposited By Reactive Low-Voltage Ion Plating

    Authors

    T. C. Kimble; M. D. Himel;K. H. Guenther

    Comments

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    Abbreviated Journal Title

    Appl. Optics

    Keywords

    Refractive-Index Profiles; Wave-Guides; Embossing Technique; Thin-Films; Microstructure; Coatings; Coupler; Optics

    Abstract

    We determine the quality of single films of various oxides, which are deposited on thermally oxidized silicon wafers by reactive low-voltage ion plating (RLVIP), by measuring their optical waveguide losses. We use a prism coupler for inserting the radiation of a wavelength-selectable He-Ne laser into the waveguide and a CCD camera for imaging the light scattered from the surface of the films. The waveguide losses of the RLVIP films are typically of the order of 1 to 10 dB/cm. Some data obtained for TiO2 layers on thermally grown SiO2 and RLVIP SiO2 seem to confirm the presence of an absorbing boundary layer between RLVIP SiO2 and TiO2 that has been found in SiO2-TiO2 multilayers. The waveguide measurements also reveal unusual index gradients in thick (approximately 10 mum) single layers Of Al2O3 derived from multimode effective index calculations.

    Journal Title

    Applied Optics

    Volume

    32

    Issue/Number

    28

    Publication Date

    1-1-1993

    Document Type

    Article

    Language

    English

    First Page

    5640

    Last Page

    5644

    WOS Identifier

    WOS:A1993LZ49700031

    ISSN

    0003-6935

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