Title
Influence of N-2/Ar gas mixture ratio and annealing on optical properties of SiCBN thin films prepared by rf sputtering
Abbreviated Journal Title
Diam. Relat. Mat.
Keywords
sputtering; SiCBN; optical properties; band gap; annealing; RAY PHOTOELECTRON-SPECTROSCOPY; SILICON-CARBON NITRIDE; HIGH-TEMPERATURE; SURFACE; DEPOSITION; Materials Science, Multidisciplinary
Abstract
Optical properties of amorphous thin films of silicon carbon boron nitride (Si-C-B-N) obtained by reactive sputtering has been studied. Compositional variations were obtained by changing the nitrogen and argon gas mixture ratio in the sputtering ambient. The effect of gas ratios and annealing on the optical properties was investigated. It was found that the transmittance of the films increases with nitrogen incorporation. Annealing at higher temperatures leads to considerable increase in transmittance. Optical energy gap (Tauc gap) calculated from absorption data is influenced by annealing temperatures and reactive process gas mixture. Changes in optical properties were correlated to the chemical modifications in the films due to annealing, through X-ray photoelectron spectroscopy. Studies reveal that the carbon and nitrogen concentrations in the films are highly sensitive to temperature. Annealing at higher temperatures leads to broken C-N bonds which results in the loss of C and N in the films. This is believed to be the primary cause for variations in optical properties of the films. (C) 2008 Elsevier B.V. All rights reserved.
Journal Title
Diamond and Related Materials
Volume
17
Issue/Number
6
Publication Date
1-1-2008
Document Type
Article
Language
English
First Page
944
Last Page
948
WOS Identifier
ISSN
0925-9635
Recommended Citation
"Influence of N-2/Ar gas mixture ratio and annealing on optical properties of SiCBN thin films prepared by rf sputtering" (2008). Faculty Bibliography 2000s. 1092.
https://stars.library.ucf.edu/facultybib2000/1092
Comments
Authors: contact us about adding a copy of your work at STARS@ucf.edu