Chemical vapor deposition of novel carbon materials

    Authors

    L. Chow; D. Zhou; A. Hussain; S. Kleckley; K. Zollinger; A. Schulte;H. Wang

    Comments

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    Abbreviated Journal Title

    Thin Solid Films

    Keywords

    chemical vapor deposition; diamond; carbon; scanning electron microscopy; DIAMOND THIN-FILMS; MICROWAVE PLASMAS; NANOTUBES; MECHANISM; EMISSION; Materials Science, Multidisciplinary; Materials Science, Coatings &; Films; Physics, Applied; Physics, Condensed Matter

    Abstract

    Nanocrystalline diamond thin films have been prepared using hot filament CVD technique with a mixture of CH4/H-2/Ar as the reactant gas. We demonstrated that the ratio of H-2 to Ar in the reactant gas plays an important role in control of the grain size of diamonds and the growth of the nanocrystalline diamonds. In addition, we have investigated the growth of carbon nanotubes from catalytic CVD using a hydrocarbon as the reactant gas. Furthermore, focused ion beam technique has been developed to control the growth of carbon nanotubes individually. (C) 2000 Elsevier Science S.A. All rights reserved.

    Journal Title

    Thin Solid Films

    Volume

    368

    Issue/Number

    2

    Publication Date

    1-1-2000

    Document Type

    Article; Proceedings Paper

    Language

    English

    First Page

    193

    Last Page

    197

    WOS Identifier

    WOS:000087414100006

    ISSN

    0040-6090

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