Title
Chemical vapor deposition of novel carbon materials
Abbreviated Journal Title
Thin Solid Films
Keywords
chemical vapor deposition; diamond; carbon; scanning electron microscopy; DIAMOND THIN-FILMS; MICROWAVE PLASMAS; NANOTUBES; MECHANISM; EMISSION; Materials Science, Multidisciplinary; Materials Science, Coatings &; Films; Physics, Applied; Physics, Condensed Matter
Abstract
Nanocrystalline diamond thin films have been prepared using hot filament CVD technique with a mixture of CH4/H-2/Ar as the reactant gas. We demonstrated that the ratio of H-2 to Ar in the reactant gas plays an important role in control of the grain size of diamonds and the growth of the nanocrystalline diamonds. In addition, we have investigated the growth of carbon nanotubes from catalytic CVD using a hydrocarbon as the reactant gas. Furthermore, focused ion beam technique has been developed to control the growth of carbon nanotubes individually. (C) 2000 Elsevier Science S.A. All rights reserved.
Journal Title
Thin Solid Films
Volume
368
Issue/Number
2
Publication Date
1-1-2000
Document Type
Article; Proceedings Paper
Language
English
First Page
193
Last Page
197
WOS Identifier
ISSN
0040-6090
Recommended Citation
"Chemical vapor deposition of novel carbon materials" (2000). Faculty Bibliography 2000s. 2469.
https://stars.library.ucf.edu/facultybib2000/2469
Comments
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