Focused ion beam/lift-out transmission electron microscopy cross sections of block copolymer films ordered on silicon substrates

    Authors

    H. White; Y. Pu; M. Rafailovich; J. Sokolov; A. H. King; L. A. Giannuzzi; C. Urbanik-Shannon; B. W. Kempshall; A. Eisenberg; S. A. Schwarz;Y. M. Strzhemechny

    Comments

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    Abbreviated Journal Title

    Polymer

    Keywords

    block copolymer; focus ion beam/lift-out; transmission electron; microscopy; X-RAY-SCATTERING; TEM SPECIMEN PREPARATION; POLYMER THIN-FILMS; DIBLOCK; COPOLYMERS; MASS-SPECTROMETRY; FREE-SURFACE; INTERFACES; SEGREGATION; CONFINEMENT; BLENDS; Polymer Science

    Abstract

    Thin poly(styrene(210)-b-2-vinylpyridine(200)) and poly(2-vinylpyridine(94)-b-styrene(760)-b-2-vinylpyridine(94)) films spun cast on silicon and annealed at 180 degreesC for 3 days were directly cross sectioned in less than 1 h using the focused ion beam (FIB) lift-out technique. We show that with the FIB procedure, it is possible to produce cross sections that reveal structure near the silicon interface and hence the surface induced phase transitions could be examined and compared quantitatively with theoretical models. Atomic force microscopy, dynamic secondary ion mass spectrometry, and transmission electron microscopy were used to characterize the films. (C) 2000 Elsevier Science Ltd. All rights reserved.

    Journal Title

    Polymer

    Volume

    42

    Issue/Number

    4

    Publication Date

    1-1-2001

    Document Type

    Article

    Language

    English

    First Page

    1613

    Last Page

    1619

    WOS Identifier

    WOS:000165303300034

    ISSN

    0032-3861

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