Additive lithography for fabrication of diffractive optics

    Authors

    M. Pitchumani; H. Hockel; W. Mohammed;E. G. Johnson

    Comments

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    Abbreviated Journal Title

    Appl. Optics

    Keywords

    ELEMENTS; Optics

    Abstract

    An innovative fabrication technique is introduced that is based on multiple-exposure techniques for micro-optics fabrication. This method utilizes various exposure times and combinations of binary and analog photo masks to sculpture complex photoresist profiles. It also demonstrates the fabrication of analog structures from the multilevel structures thus formed by using resist reflow.

    Journal Title

    Applied Optics

    Volume

    41

    Issue/Number

    29

    Publication Date

    1-1-2002

    Document Type

    Article

    Language

    English

    First Page

    6176

    Last Page

    6181

    WOS Identifier

    WOS:000178495200015

    ISSN

    1559-128X

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