Title

Modeling vapor deposition of metal/semiconductor-polymer nanocomposite

Authors

Authors

H. W. Song; O. J. Ilegbusi;L. I. Trakhtenberg

Comments

Authors: contact us about adding a copy of your work at STARS@ucf.edu

Abbreviated Journal Title

Thin Solid Films

Keywords

physical vapor deposition; condensation; nanostructure; polymer; CONDENSATION COEFFICIENTS; CRYOCHEMICAL SYNTHESIS; FILMS; GROWTH; NANOPARTICLES; CODEPOSITION; NUCLEATION; RADIATION; PARTICLES; SURFACES; Materials Science, Multidisciplinary; Materials Science, Coatings &; Films; Physics, Applied; Physics, Condensed Matter

Abstract

A mathematical model is developed to describe the deposition of metal/semiconductor (M/SC) and monomer vapors at low temperature. An expression is proposed for the condensation coefficient of M/SC on the polymer surface, to represent the effect of temperature and polymer surface roughness. The nucleation of M/SC clusters strongly depends on the deposition rate and the temperature. However, their growth, size and final distribution depend on the monomer deposition rate and the subsequent polymerization process. High polymer deposition rate produces a particle distribution with a small mean size and a blunt shape in large size cluster. This prediction is in good agreement with the experimental data. (c) 2004 Published by Elsevier B.V.

Journal Title

Thin Solid Films

Volume

476

Issue/Number

1

Publication Date

1-1-2005

Document Type

Article

Language

English

First Page

190

Last Page

195

WOS Identifier

WOS:000227509100029

ISSN

0040-6090

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