Modeling vapor deposition of metal/semiconductor-polymer nanocomposite

    Authors

    H. W. Song; O. J. Ilegbusi;L. I. Trakhtenberg

    Comments

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    Abbreviated Journal Title

    Thin Solid Films

    Keywords

    physical vapor deposition; condensation; nanostructure; polymer; CONDENSATION COEFFICIENTS; CRYOCHEMICAL SYNTHESIS; FILMS; GROWTH; NANOPARTICLES; CODEPOSITION; NUCLEATION; RADIATION; PARTICLES; SURFACES; Materials Science, Multidisciplinary; Materials Science, Coatings &; Films; Physics, Applied; Physics, Condensed Matter

    Abstract

    A mathematical model is developed to describe the deposition of metal/semiconductor (M/SC) and monomer vapors at low temperature. An expression is proposed for the condensation coefficient of M/SC on the polymer surface, to represent the effect of temperature and polymer surface roughness. The nucleation of M/SC clusters strongly depends on the deposition rate and the temperature. However, their growth, size and final distribution depend on the monomer deposition rate and the subsequent polymerization process. High polymer deposition rate produces a particle distribution with a small mean size and a blunt shape in large size cluster. This prediction is in good agreement with the experimental data. (c) 2004 Published by Elsevier B.V.

    Journal Title

    Thin Solid Films

    Volume

    476

    Issue/Number

    1

    Publication Date

    1-1-2005

    Document Type

    Article

    Language

    English

    First Page

    190

    Last Page

    195

    WOS Identifier

    WOS:000227509100029

    ISSN

    0040-6090

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