Development of a two-dimensional phase-grating mask for fabrication of an analog-resist profile

    Authors

    J. W. Sung; H. Hockel; J. D. Brown;E. G. Johnson

    Comments

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    Abbreviated Journal Title

    Appl. Optics

    Keywords

    LITHOGRAPHY; MICROLENS; LENS; Optics

    Abstract

    Fabrication of a thick analog profile with photoresist is a difficult task in photolithography. We demonstrate that a binary phase-grating photomask with an appropriate period and duty cycles is capable of manipulating the exposure illumination in an analog fashion and can be used for fabrication of the desired analog micro-optics profiles on the surface of a thick photoresist. By choosing the proper period and variation of duty cycle of the phase-grating mask, one can create the desired analog intensity of exposure illumination for an optical stepper. This allows the formation of a wide range of analog micro-optics profiles with an SPR 220-7 photoresist. The numerical convolution of the diffraction efficiency curve and resist exposure characteristics is used to predict the final resist profile and also to design the appropriate duty-cycle distribution for the binary phase grating. As a demonstration of this technology, we fabricated a variety of micro-optical elements, such as a positive lens, ring lens, prism, and vortex of similar to 100-200 mu m diameter, by using a phase-grating mask fabricated in a poly(methyl methaerylate) electron-beam resist. (c) 2006 Optical Society of America.

    Journal Title

    Applied Optics

    Volume

    45

    Issue/Number

    1

    Publication Date

    1-1-2006

    Document Type

    Article

    Language

    English

    First Page

    33

    Last Page

    43

    WOS Identifier

    WOS:000234553600005

    ISSN

    1559-128X

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