Title

Characterization of Pt-Ru binary alloy thin films for work function tuning

Authors

Authors

R. M. Todi; A. P. Warren; K. B. Sundaram; K. Barmak;K. R. Coffey

Comments

Authors: contact us about adding a copy of your work at STARS@ucf.edu

Abbreviated Journal Title

IEEE Electron Device Lett.

Keywords

gate electrode; metal alloy; platinum-ruthenium (Pt-Ru); work function; CMOS; Engineering, Electrical & Electronic

Abstract

This letter describes materials and electrical characterization of Pt-Ru binary alloy metal gate electrodes for control of the electrode work function. The work function of the Pt-Ru binary alloy system can be tuned over a wide range of 4.8-5.2 eV. The results indicate that the change of film properties, i.e., resistivity, work function, and crystal structure, with composition is, consistent with the equilibrium phase diagram and that the work function in the face-centered cubic and hexagonal close-packed single-phase regions is only weakly dependent on composition, whereas a strong dependence is observed in the intermediate compositional range.

Journal Title

Ieee Electron Device Letters

Volume

27

Issue/Number

7

Publication Date

1-1-2006

Document Type

Article

DOI Link

http://dx.doi.org/10.1109/led.2006.876326

Language

English

First Page

542

Last Page

545

WOS Identifier

WOS:000238712200005

ISSN

0741-3106

Recommended Citation

"Characterization of Pt-Ru binary alloy thin films for work function tuning" (2006). Faculty Bibliography 2000s. 6651.
https://stars.library.ucf.edu/facultybib2000/6651