Xenon capillary discharge extreme-ultraviolet source emitting over a large angular range

    Authors

    M. A. Klosner;W. T. Silfvast

    Comments

    Authors: contact us about adding a copy of your work at STARS@ucf.edu

    Abbreviated Journal Title

    Appl. Optics

    Keywords

    RAY PROJECTION LITHOGRAPHY; REGION; Optics

    Abstract

    We describe a capillary discharge source configuration, allowing for collection of extreme-ultraviolet (EUV) radiation at large off-axis angles, without the need for an EUV window. Operating with xenon gas, the source emits intensely within the EUV spectral region at 11.3 and 13.5 nm. When coupled with a high-collection-efficiency optical system, this source may be suitable for a number of high-average-power EUV imaging applications. (C) 2001 Optical Society of America.

    Journal Title

    Applied Optics

    Volume

    40

    Issue/Number

    27

    Publication Date

    1-1-2001

    Document Type

    Article

    Language

    English

    First Page

    4849

    Last Page

    4851

    WOS Identifier

    WOS:000171028400010

    ISSN

    1559-128X

    Share

    COinS