Influence of precursor gas ratio and firing on silicon surface passivation by APCVD aluminium oxide

    Authors

    K. O. Davis; K. Y. Jiang; M. Wilson; C. Demberger; H. Zunft; H. Haverkamp; D. Habermann;W. V. Schoenfeld

    Comments

    Authors: contact us about adding a copy of your work at [email protected]

    Abbreviated Journal Title

    Phys. Status Solidi-Rapid Res. Lett.

    Keywords

    atmospheric pressure CVD; silicon; passivation; aluminum oxide; CHEMICAL-VAPOR-DEPOSITION; ATOMIC-LAYER DEPOSITION; SOLAR-CELLS; AL2O3; SEMICONDUCTORS; TEMPERATURE; MORPHOLOGY; PECVD; ALD; Materials Science, Multidisciplinary; Physics, Applied; Physics, ; Condensed Matter

    Abstract

    Using a high throughput, in-line atmosphere chemical vapor deposition (APCVD) tool, we have synthesized amorphous aluminum oxide (AlOx) films from precursors of trimethyl-aluminum (TMA) and O-2, yielding a maximum deposition 150 nm min(-1) per wafer. For p-type crystalline silicon (c-Si) wafers, excellent surface passivation was achieved with the APCVD AlOx films, with a best maximum effective surface recombination velocity (S-eff,S-max) of 8 cm/s following a standard industrial firing step. The findings could be attributed to the existence of large negative charge (Q(f) approximate to -3 x 10(12) cm(-2)) and low interface defect density (D-it approximate to 4 x 10(11) eV(-1) cm(-2)) achieved by the films. This data demonstrates a high potential for APCVD AlOx to be used in high efficiency, low cost industrial solar cells. ((c) 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

    Journal Title

    Physica Status Solidi-Rapid Research Letters

    Volume

    7

    Issue/Number

    11

    Publication Date

    1-1-2013

    Document Type

    Article

    Language

    English

    First Page

    942

    Last Page

    945

    WOS Identifier

    WOS:000328321700002

    ISSN

    1862-6254

    Share

    COinS
     

    Accessibility Statement

    This item was created or digitized prior to April 24, 2027, or is a reproduction of legacy media created before that date. It is preserved in its original, unmodified state specifically for research, reference, or historical recordkeeping. In accordance with the ADA Title II Final Rule, the University Libraries provides accessible versions of archival materials upon request. To request an accommodation for this item, please submit an accessibility request form.