Nanoimprinting Techniques for Large-Area Three-Dimensional Negative Index Metamaterials with Operation in the Visible and Telecom Bands

    Authors

    L. Gao; K. Shigeta; A. Vazquez-Guardado; C. J. Progler; G. R. Bogart; J. A. Rogers;D. Chanda

    Comments

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    Abbreviated Journal Title

    ACS Nano

    Keywords

    nanoimprint lithography; negative index; metamaterials; IMPRINT LITHOGRAPHY; REFRACTIVE-INDEX; WAVELENGTHS; FREQUENCIES; REALIZATION; SCALE; Chemistry, Multidisciplinary; Chemistry, Physical; Nanoscience &; Nanotechnology; Materials Science, Multidisciplinary

    Abstract

    We report advances in materials, designs, and fabrication schemes for large-area negative index metamaterials (NIMs) in multilayer "fishnet" layouts that offer negative index behavior at wavelengths into the visible regime. A simple nanoimprinting scheme capable of implementation using standard, widely available tools followed by a subtractive, physical liftoff step provides an enabling route for the fabrication. Computational analysis of reflection and transmission measurements suggests that the resulting structures offer negative index of refraction that spans both the visible wavelength range (529-720 nm) and the telecommunication band (1.35-1.6 mu m). The data reveal that these large ( >75 cm(2)) imprinted NIMs have predictable behaviors, good spatial uniformity in properties, and figures of merit as high as 4.3 in the visible range.

    Journal Title

    Acs Nano

    Volume

    8

    Issue/Number

    6

    Publication Date

    1-1-2014

    Document Type

    Article

    Language

    English

    First Page

    5535

    Last Page

    5542

    WOS Identifier

    WOS:000338089200018

    ISSN

    1936-0851

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