Nanoceria: factors affecting its pro- and anti-oxidant properties

Authors

    Authors

    E. Grulke; K. Reed; M. Beck; X. Huang; A. Cormack;S. Seal

    Comments

    Authors: contact us about adding a copy of your work at STARS@ucf.edu

    Abbreviated Journal Title

    Environ.-Sci. Nano

    Keywords

    CERIUM OXIDE NANOPARTICLES; CHEMICAL MOLECULAR-DYNAMICS; SOLID-SOLUTION; INTERFACE; OXIDATIVE STRESS; PROTEIN CORONA; DIOXIDE NANOPARTICLES; SURFACE MODIFICATION; AQUEOUS SYSTEMS; PHASE-STABILITY; INDUCED DAMAGE; Chemistry, Multidisciplinary; Environmental Sciences; Nanoscience &; Nanotechnology

    Abstract

    Nanoceria redox properties are affected by particle size, particle shape, surface chemistry, and other factors, such as additives that coat the surface, local pH, and ligands that can participate in redox reactions. Each CeO2 crystal facet has a different chemistry, surface energy, and surface reactivity. Unlike nanoceria's industrial catalytic applications, biological and environment exposures are characterized by high water activity values and relatively high oxygen activity values. Electrochemical data show that oxygen levels, pH, and redox species affect its phase equilibria for solution and dissolution. However, not much is known about how the many and varied redox ligands in environmental and biological systems might affect nanoceria's redox behaviour, the effects of coated surfaces on redox rates and mechanisms, and whether the ceria solid phase undergoes dissolution at physiologically relevant pH and oxygen levels. Research that could answer these questions would improve our understanding of the links between nanoceria's redox performance and its morphology and environmental conditions in the local milieu.

    Journal Title

    Environmental Science-Nano

    Volume

    1

    Issue/Number

    5

    Publication Date

    1-1-2014

    Document Type

    Review

    Language

    English

    First Page

    429

    Last Page

    444

    WOS Identifier

    WOS:000347974400003

    ISSN

    2051-8153

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