Gate oxide integrity for deep submicron CMOS device/circuit reliability

Keywords

Metal oxide semiconductors, Complementary Metal oxide semiconductors

Notes

This item is only available in print in the UCF Libraries. If this is your thesis or dissertation, you can help us make it available online for use by researchers around the world by STARS for more information.

Graduation Date

Spring 2001

Advisor

Yuan, Jiann S.

Degree

Doctor of Philosophy (Ph.D.)

College

College of Engineering and Computer Science

Department

Electrical Engineering and Computer Science

Format

Print

Language

English

Length of Campus-only Access

None

Access Status

Doctoral Dissertation (Open Access)

Subjects

Dissertations, Academic -- Engineering; Engineering -- Dissertations, Academic

This document is currently not available here.

Share

COinS